NST-600-3HD three-target magnetron sputtering coater
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials
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NST-600-3HD three-target magnetron sputtering coater is a newly developed coating equipment, which can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical Film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
NST-600-3HD three-target magnetron sputtering coater specifications:
|Name||NST-300-3HD three-target magnetron sputtering coater|
|Installation conditions||This equipment is required to be used at the altitude of 1000m or less, the temperature of 25℃± 15℃, and the humidity of 55% Rh ± 10% Rh.
1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water)
2. Electricity: AC220V 50Hz, must have a good ground connection.
3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule joint) and pressure reducing valve
4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg
5. Ventilation device: need
|Main features||1. Configure three target guns, it can be used for RF coating power supply for sputter coating of non-conductive targets, or DC power supply for sputter coating of conductive materials (target guns can be exchanged according to customer needs).
2. It can prepare a variety of films, and has a wide range of applications.
3. It is small in size and easy to operate.
4. the modular design of the whole machine, vacuum chamber, vacuum pump set, control power supply split type design, it can be adjusted according to the actual needs of users.
5. you can choose the power supply according to your actual needs, it can control multiple target guns with one power supply, or control one target gun with multiple power sources
|Technical parameters||1. the power supply voltage: 220V 50Hz
2. total power: 2.5W (excluding vacuum pump)
3. Working vacuum degree: 10-4Pa
4. working temperature: RT-500℃, accuracy ± 1℃(you can increase the temperature according to actual needs)
5. the number of target guns: 3
6. target gun cooling method: water cooling
7. Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target material)
8. DC sputtering power: 500W (optional)
9. RF sputtering power: 300W / 500W (optional)
10. loading sample table: Ø140mm
11. the sample table speed: adjustable within 1rpm-20rpm
12. Protective gas: inert gases such as Ar and N2
13. Intake gas path: mass flow meter controls 2 channels of intake air, 1 flow is 100 SCCM, 1 flow is 200 SCCM
|specifications||Main unit size: 500mm×560mm×660mm, the whole machine size: 1300mm×660mm×1200mm; weight: 160kg|
|Standard accessories||1||DC power control system||1|
|2||RF power control system||1|
|3||Film thickness monitor system||1|
|6||Cooling water pipe (Ø6mm)||4|
|Standard accessories||Various targets such as gold, indium, silver, and platinum|