NST Dual chamber pulse laser coater

NST Dual chamber pulse laser coater

NST Dual chamber pulse laser coater

1.00

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1.00

NST Dual chamber pulse laser coater consists of vacuum chamber (main sputtering chamber, sample inlet chamber), sample transfer mechanism, sample frame, rotating target table, vacuum exhaust, vacuum measurement, electrical control, gas distribution, computer control and other parts.

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Description

TECHNICAL PARAMETER

NST Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

Dual chamber pulse laser coater specifications:

Main vacuum system Sphere structure,   size:Ø 450mm
Loading sample system Vertical cylindrical stucture, size: Ø 150×150mm
Vacuum system configuration Main vacuum chamber Mechanical   pump, molecular pump, valve
Loading sample system Mechanical   pump and molecular pump(sharing with primary chamber), valve
Ultimate   pressure Main vacuum system ≤6*10-6Pa(after baking and degassing)
Loading sample   system ≤6*10-3 Pa(after baking and degassing)
Vacuum recovery  system Main vacuum system It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)
Loading sample   system It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)
Rotating target platform The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm
Substrate   heating platform Sample size Ø51
Mode of motion Substrate rotates continuously, rotation speed:5-60 rpm
Heating temperature Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable
Gas   circuit system 1-circuit mass flow controller, 1-circuit inflation valve
Optional   accessories Laser device Compatible with coherent 201 laser
Laser beam scanning device 2D scanning mechanical platform, perform two degree of freedom scanning.
Computer control system The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc.
Space occupied Main unit 1800 * 1800mm2
Electric cabinet 700 *700mm2(one)

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