NST-dual-head high vacuum magnetron plasma sputtering coater
NST-dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
- Reviews (0)
NST-dual-head high vacuum magnetron plasma sputtering coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
NST-dual-head high vacuum magnetron plasma sputtering coater specifications:
|Input Power||Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller)|
|Magnetron Sputtering Head||
|Gas Flow Control||
|Vacuum Pump Station||
|Overall Dimensions||Lid closed: 48″ × 28″ × 32″
Lid open: 48″ × 28″ × 37″
|Net Weight||160 kg|
|Warranty||One years limited warranty with lifetime support|